L.J. Terminello, A.B. McLean, et al.
Review of Scientific Instruments
In this review of recent progress in lithography and microscopy by X-rays the authors show how X-ray lithography is used to replicate microcircuit patterns with dimensions below 1 mu m, and how these advances have improved the older technique of X-ray microradiography.
L.J. Terminello, A.B. McLean, et al.
Review of Scientific Instruments
E. Spiller, D.E. Eastman, et al.
Journal of Applied Physics
R. Feder, E. Spiller, et al.
Polymer Engineering & Science
E. Spiller, I. Hailer, et al.
Applied Optics