Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Macromodelling is a new area of circuit theory which has gained importance with the advent of large scale integration for semiconductor chips. These integrated circuits require an analysis capability which far exceeds presently available computer-aided network analysis programs. This paper gives an overview of work which pertains to the area of macromodelling. Also, recent progress in macroanalysis is discussed, such as the latent approach, which is a method which takes advantage of the natural small activity in large systems. © 1978.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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CAD Computer Aided Design
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SPIE Optical Science, Engineering, and Instrumentation 1998
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SSST 2008