Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
S.F. Fan, W.B. Yun, et al.
Proceedings of SPIE 1989
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence