Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Let G = (V, E) be any d-regular graph with girth g on n vertices, for d ≥ 3. This note shows that G has a maximum matching which includes all but an exponentially small fraction of the vertices, O((d - 1)-g/2). Specifically, in a maximum matching of G, the number of unmatched vertices is at most n/n0(d, g), where n0(d, g) is the number of vertices in a ball of radius [(g - 1)/2] around a vertex, for odd values of g, and around an edge, for even values of g. This result is tight if n < 2n 0(d, g).
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998