Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ergodic properties of rational maps are studied, generalising the work of F. Ledrappier. A new construction allows for simpler proofs of stronger results. Very general conformal measures are considered. Equivalent conditions are given for an ergodic invariant probability measure with positive Lyapunov exponent to be absolutely continuous with respect to a general conformal measure. If they hold, we can construct an induced expanding Markov map with integrable return time which generates the invariant measure. © 2012 American Mathematical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
David W. Jacobs, Daphna Weinshall, et al.
IEEE Transactions on Pattern Analysis and Machine Intelligence
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering