Xiaozhu Kang, Hui Zhang, et al.
ICWS 2008
No abstract available.
Xiaozhu Kang, Hui Zhang, et al.
ICWS 2008
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
M.F. Cowlishaw
IBM Systems Journal
N.K. Ratha, A.K. Jain, et al.
Workshop CAMP 2000