Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Here we report the controlled generation of micelle-templated organosilicate nanostructures resulting from self-assembly of a block copolymer/ organosilicate mixture followed by organosilicate vitrification and copolymer thermolysis. Variation of solution condition and the copolymer/ organosilicate mixture composition generates widely different film morphologies ranging from toroids to linear features to contiguous nanoporous monolayers. The use of reactive organosilicates for block copolymer templation generates functional inorganic nanostructures with thermal and mechanical stability. © 2006 American Chemical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
R. Ghez, M.B. Small
JES
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
A. Krol, C.J. Sher, et al.
Surface Science