O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
The resolution of electron beam exposure of resist has been measured at an accelerating voltage of 350 kV using a modified high voltage transmission electron microscope. The equipment and aspects of its performance are described. The methods developed have been used to fabricate metal nanostructures with dimensions smaller than 10 nm. © 1989.
O.F. Schirmer, K.W. Blazey, et al.
Physical Review B
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
Andreas C. Cangellaris, Karen M. Coperich, et al.
EMC 2001
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings