Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
The resolution of electron beam exposure of resist has been measured at an accelerating voltage of 350 kV using a modified high voltage transmission electron microscope. The equipment and aspects of its performance are described. The methods developed have been used to fabricate metal nanostructures with dimensions smaller than 10 nm. © 1989.
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
R. Ghez, M.B. Small
JES
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997