Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
During the last half century, a dramatic downscaling of electronics has taken place, a miniaturization that the industry expects to continue for at least a decade. We present efforts to use the self-assembly of one-dimensional semiconductor nanowires1 in order to bring new, high-performance nanowire devices as an add-on to mainstream Si technology. The nanowire approach offers a coaxial gate-dielectric-channel geometry that is ideal for further downscaling and electrostatic control, as well as heterostructure-based devices on Si wafers. © 2006 Elsevier Ltd. All rights reserved.
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
Michiel Sprik
Journal of Physics Condensed Matter
K.N. Tu
Materials Science and Engineering: A
C.M. Brown, L. Cristofolini, et al.
Chemistry of Materials