Single and dual wavelength exposure of photoresist
J. LaRue, C. Ting
Proceedings of SPIE 1989
New basis functions and solution procedures for p‐version finite element analysis are described. They are used in a highly efficient p‐version finite element solver for linear elastostatics and dynamics, which has been used in an industrial environment for over two years. Using two sample applications it is shown that, using the techniques proposed here, p‐version finite element analysis can have a substantially lower computational cost, for given accuracy, than standard finite element methods. This makes the industrial applicability of p‐version finite element analysis much wider than is commonly believed. Copyright © 1993 John Wiley & Sons, Ltd
J. LaRue, C. Ting
Proceedings of SPIE 1989
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
James Lee Hafner
Journal of Number Theory