R. Tsu, H. Kawamura, et al.
Solid State Communications
In the accompanying paper we have given evidence that pulsed laser annealing of Si does not involve normal thermal melting and recrystallization. Here we argue the importance of the electron-hole plasma produced by the laser to the annealing process. © 1979.
R. Tsu, H. Kawamura, et al.
Solid State Communications
H. Kawamura, R. Tsu, et al.
Physical Review Letters
R. Tsu, G.H. Döhler
Physical Review B
R. Tsu, L. Esaki
Applied Physics Letters