R. Tsu, H. Kawamura, et al.
Solid State Communications
In the accompanying paper we have given evidence that pulsed laser annealing of Si does not involve normal thermal melting and recrystallization. Here we argue the importance of the electron-hole plasma produced by the laser to the annealing process. © 1979.
R. Tsu, H. Kawamura, et al.
Solid State Communications
J.M. Gibson, R. Tsu
Applied Physics Letters
J.A. Van Vechten, R. Tsu, et al.
Physics Letters A
J.A. Van Vechten
Physical Review B