J.R. Kirtley, T.N. Theis, et al.
Physical Review B
Raman scattering and optical transmission measurements have been made on chemically vapor-deposited Si-rich SiO2 films. The measurements show segregated regions of amorphous silicon in the as-deposited films. Annealing the films at 1150°C completely crystallizes the amorphous silicon. Annealing at lower temperatures produces films with both amorphous and crystalline regions.
J.R. Kirtley, T.N. Theis, et al.
Physical Review B
J.C. Tsang, J.E. Smith Jr., et al.
Solid State Communications
J.C. Tsang, M. Freitag, et al.
Nature Nanotechnology
J.C. Tsang
JVSTA