Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We further develop the 0/1 ILP formulation of Lee for edge coloring where colors are encoded in binary. With respect to that formulation, our main contributions are (i) an efficient separation algorithm for general block inequalities, (ii) an efficient LP-based separation algorithm for stars (i.e., the all-different polytope), (iii) an introduction of matching inequalities, (iv) an introduction of switched path inequalities and their efficient separation, (v) a complete description for paths, and (vi) the promising computational results. © 2007 INFORMS.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Oliver Bodemer
IBM J. Res. Dev
S.M. Sadjadi, S. Chen, et al.
TAPIA 2009
Yigal Hoffner, Simon Field, et al.
EDOC 2004