T.H. Distefano
Japanese Journal of Applied Physics
Paper
On Al–SiO2interfaces and oxidation temperatures
Related
Conference paper
High-sensitivity silicide films for optical recording
K.Y. Ahn, T.H. Distefano, et al.
CLEO 1982
A.F. Mayadas, G.R. Henry, et al.
Applied Physics Letters
T.H. Distefano
Applied Physics Letters