Strong and flexible domain typing for dynamic E-business
Yigal Hoffner, Simon Field, et al.
EDOC 2004
The metallization layers required for a silicon- based reflective liquid crystal light valve have been developed and integrated with a medium-voltage CMOS process using standard microelectronic manufacturing tools. Unique requirements include the following: 1) shielding the Si devices from incident light so that electron-hole pairs are not formed; 2) high optical throughput and contrast, which are dependent on the mirror fill factor, reflectivity, and flatness; 3) pixel storage capacitance to maintain the voltage across the liquid crystal cell with sufficient accuracy to select the desired gray level until the data are updated; and 4) precise control of the liquid crystal cell thickness without spacers obscuring the mirrors. Wafers have been successfully fabricated to support a technology demonstration of a 2048 × 2048-pixel ("four- million-pixel") projection display. The process is based on a medium-voltage CMOS process and uses six masks (for three metal levels, one via level, and two insulator levels) after Si device processing has been completed.
Yigal Hoffner, Simon Field, et al.
EDOC 2004
M.J. Slattery, Joan L. Mitchell
IBM J. Res. Dev
Apostol Natsev, Alexander Haubold, et al.
MMSP 2007
David S. Kung
DAC 1998