PaperQuantum Simulators: Architectures and OpportunitiesEhud Altman, Kenneth R. Brown, et al.PRX Quantum
Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
Conference paperCharacterization of photoresist spatial resolution by interferometric lithographyJohn A. Hoffnagle, William D. Hinsberg, et al.Microlithography 2003
Conference paperBounds on the ergodic capacity of training-based multiple-antenna systemsSimeon Furrer, Dirk DahlhausISIT 2005
