Shaoning Yao, Wei-Tsu Tseng, et al.
ADMETA 2011
Paper
On the mechanism of diffusion-induced boundary migration
Abstract
A grain-boundary-dislocation mechanism for diffusion-induced boundary migration is proposed. It is suggested that point-defect emission from grain-boundary dislocations is necessary for the solution and transport of substitutional solutes. Grain-boundary migration occurs as a by-product of the emission of point defects, owing to the requirement that the dislocation remain in the grain-boundary plane. © 1981 Taylor & Francis Group, LLC.
Related
Eloisa Bentivegna
Big Data 2022
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Mitsuru Ueda, Hideharu Mori, et al.
Journal of Polymer Science Part A: Polymer Chemistry