Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
This paper considers the number of inner iterations required per outer iteration for the algorithm proposed by Conn et al. [9]. We show that asymptotically, under suitable reasonable assumptions, a single inner iteration suffices.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Yi Zhou, Parikshit Ram, et al.
ICLR 2023