Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solutionMoutaz Fakhry, Yuri Granik, et al.SPIE Photomask Technology + EUV Lithography 2011