Characterization of a next generation step-and-scan system
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
In this paper we consider a well-known class of valid inequalities for the p-median and the uncapacitated facility location polytopes, the odd cycle inequalities. It is known that their separation problem is polynomially solvable. We give a new polynomial separation algorithm based on a reduction from the original graph. Then, we define a non-trivial class of graphs, where the odd cycle inequalities together with the linear relaxations of both the p-median and uncapacitated facility location problems, suffice to describe the associated polytope. To do this, we first give a complete description of the fractional extreme points of the linear relaxation for the p-median polytope in this class of graphs. © 2007 Elsevier Ltd. All rights reserved.
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Da-Ke He, Ashish Jagmohan, et al.
ISIT 2007
John S. Lew
Mathematical Biosciences