William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
The BSMSn source is addressed in this study. It is shown that BSMSn is not successively refinable under the Hamming distortion measure, provided that n > 2.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Minghong Fang, Zifan Zhang, et al.
CCS 2024
T. Graham, A. Afzali, et al.
Microlithography 2000
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997