PaperA nonlinear eigenvalue problem for rotating rodsF. Odeh, I. TadjbakhshArchive for Rational Mechanics and Analysis
Conference paperTotal Source Mask Optimization: High-capacity, resist modeling, and production-ready mask solutionMoutaz Fakhry, Yuri Granik, et al.SPIE Photomask Technology + EUV Lithography 2011
PaperA generic grouping algorithm and its quantitative analysisArnon Amir, Michael LindenbaumIEEE Transactions on Pattern Analysis and Machine Intelligence