Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Monte Carlo matrix trace estimation is a popular randomized technique to estimate the trace of implicitly-defined matrices via averaging quadratic forms across several observations of a random vector. The most common approach to analyze the quality of such estimators is to consider the variance over the total number of observations. In this paper we present a procedure to compute the variance of the estimator proposed by Kong and Valiant [Ann. Statist. 45 (5), pp. 2218 - 2247] for the case of Gaussian random vectors and provide a sharper bound than previously available.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Simeon Furrer, Dirk Dahlhaus
ISIT 2005
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
J. LaRue, C. Ting
Proceedings of SPIE 1989