A. Gangulee, F.M. D'Heurle
Thin Solid Films
We present a detailed experimental and theoretical study of vertical ambipolar transport in semiconductor heterostructures. A high-resolution time-of-flight method using two vertically separated quantum wells of different well widths is applied to probe the carrier transport perpendicular to the heterointerfaces. By a numerical simulation the ambipolar diffusivities as well as surface and interface recombination velocities in GaAs/AlxGa1-xAs structures are determined. This paper emphasizes the importance of surface and interface recombination for the analysis of the transport data. Alloy-disorder scattering is found to limit the ambipolar mobilities between 40 and 120 K in the Al0.5Ga0.5As barriers with acoustic-deformation-potential and polar-optical scattering participating above 120 K. In addition to the transport properties, we also obtain information on carrier capture from the barrier layers into the quantum well as a function of temperature. © 1991 The American Physical Society.
A. Gangulee, F.M. D'Heurle
Thin Solid Films
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
S. Cohen, T.O. Sedgwick, et al.
MRS Proceedings 1983
T.N. Morgan
Semiconductor Science and Technology