Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
This paper intends to re-examine some results and proofs given in a previous publication on optimal estimation under uncertainty. In a rather general setting we showed that regularization of an element of a linear space relative to a quadratic criterion and inaccurate linear observations is an optimal method for recovering a linear operator of that element. For this to be the case, the regularization parameter must be chosen with care. © 1993 J.C. Baltzer AG, Science Publishers.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989