F. Tong, C.-S. Li, et al.
Electronics Letters
A mirror structure for reflective Si-based light valves was fabricated using chemical-mechanical polishing and a thin 150-nm Al(Cu)/Ti mirror to minimize hillock formation. The use of chemical-mechanical polishing planarization resulted in only a 1% loss in reflectivity from topography under the mirrors. The reflectivity for pixel sizes from 7.5 to 40 μm and 0.7- or 0.5-μm gaps were measured, and the performance of TN LC pixels with different sizes and inversion methods are reported.
F. Tong, C.-S. Li, et al.
Electronics Letters
J.A. Kash, F.E. Doany, et al.
OFC/NFOEC 2006
E.G. Colgan, P.M. Alt, et al.
IBM J. Res. Dev
E.G. Colgan, J.P. Gambino, et al.
Materials Chemistry and Physics