Conference paper
Strategies for crosslinking NLO-polymers across the chromophore
K. Betterton, M. Ebert, et al.
ACS Spring 1991
Recent developments in applications of polymers as resists in microlithography are reviewed. Emphasis is placed on the advances in materials and processes associated with current photolithographic resists designed to extend the utility of photolithography into the submicrometer regime and to ensure continued dominance of photolithographic technology in commercial manufacture of integrated circuits.
K. Betterton, M. Ebert, et al.
ACS Spring 1991
W.D. Hinsberg, C.G. Willson, et al.
Proceedings of SPIE 1989
W.D. Hinsberg, C.G. Willson, et al.
JES
R. Zentel, H. Poths, et al.
Polymers for Advanced Technologies