R.H. Koch, W.J. Gallagher, et al.
Applied Physics Letters
Enhancement of giant magnetoresistance properties of single (bottom) and dual IrMn-based spin valves through exposure of part of the CoFe pinned layer to O2 is reported. Under optimal conditions, a ΔR/R of 10.4% [Hua=460 Oe, Hf=5.1 Oe, and Hc = 4.7 Oe for a free and pinned layer thickness (permalloy equivalent) of 50 Å each] for an ion beam sputtered single spin valve, and a ΔR/R of as high as 20.5% for a magnetron sputtered dual spin valve having a 30 Å thick CoFe free layer are observed, compared to a value of 6.5% and 10.6% for the corresponding spin valve without O2 exposure, respectively. Transmission electron microscopy results reveal the presence of a thin (10 Å) crystalline oxygen-containing layer near the IrMn-CoFe pinned layer interface as a result of O2 exposure. X-ray reflectivity data show smoother interfaces for the spin valves subjected to O2 exposure, consistent with the lower Hf and smaller sheet resistance observed for these samples. The enhanced ΔR/R thus can be attributed to improved growth after O2 exposure. © 2001 American Institute of Physics.
R.H. Koch, W.J. Gallagher, et al.
Applied Physics Letters
Eric E. Fullerton, D.T. Margulies, et al.
Applied Physics Letters
Q.R. Huang, Willi Volksen, et al.
Chemistry of Materials
W.-Y. Lee, J.R. Salem, et al.
Applied Physics Letters