Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A general theorem concerning the parallel representation of systems is proved, using the also general notions of terminal factorization situation and quotient in a category. Applications are given to the decomposition and synthesis of a number of kinds of systems. © 1976.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Juliann Opitz, Robert D. Allen, et al.
Microlithography 1998
George Markowsky
J. Math. Anal. Appl.
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence