Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
TOF-SIMS spectra of perfluoro-poly(ethers) (PFPE) with hydroxyl end group(s), Fomblin Z-DOL, Krytox-OH, and Demnum-SA, were analyzed. Previously we have observed that while the positive-ion TOF-SIMS spectra of nonfunctionalized PFPEs are complex and compressed toward the low mass end, the negative-ion spectra show intense simple patterns persisting into a high mass region surpassing the mean molecular weight of the polymer. The rich negative-ion spectra of nonfunctionalized PFPEs are ascribed to anions generated by one-event dissociative capture of low-energy secondary electrons by ether oxygens of the polymer backbone: R-O-R′ + e- →R-O0 + •R′. In stark contrast to nonfunctionalized PFPEs, PFPEs with hydroxyl end group(s) showed, in the positive-ion spectra, a fragmentation pattern persisting into the high mass region and a pattern clearly associated with the parent molecule (molecular weight) distribution. In the negative-ion spectra, the pattern due to anions R-O- encompassing the hydroxyl sector was totally absent. The observed anomalies can be accounted for if one postulates that PFPEs with hydroxyl end group(s) have a strong propensity to ionize at the hydroxyl sector. A possible relevance of such a propensity to the bonding mechanism of Z-DOL (Fomblin Z with hydroxyl end groups) to the carbon overcoat of magnetic recording disks is conjectured.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
J.K. Gimzewski, T.A. Jung, et al.
Surface Science
Arvind Kumar, Jeffrey J. Welser, et al.
MRS Spring 2000
P. Martensson, R.M. Feenstra
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films