U. Hofer, Leping Li, et al.
QELS 1992
The use of physisorbed species as a template for patterning of adsorbate monolayers at surfaces on the micron scale is demonstrated. A physisorbed monolayer is partially removed by laser-induced thermal desorption and serves as a mask during exposure of the final (chemisorbed) adsorbate species, thus acting in a manner similar to a monolayer photoresist. The effect, which has been demonstrated for H/Xe/Si(111)− 7 × 7, permits clean and precise patterning of monolayers of strongly bound and/or thermally unstable adsorbates. © 1997 American Physical Society.
U. Hofer, Leping Li, et al.
QELS 1992
G.A. Reider, U. Höfer, et al.
Physical Review Letters
N.J. Chou, A.D. Marwick, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
U. Höfer, Leping Li, et al.
Physical Review B