PREVAIL - A high throughput e-beam projection approach for next generation lithography

Abstract

PREVAIL - Projection Reduction Exposure with Variable Axis Immersion Lenses represents the high throughput e-beam projection approach to NGL which 1BM is pursuing with Nikon as alliance partner. This talk will discuss the challenges and accomplishments of the PREVAIL project. It will focus on the results obtained with the Proof of Concept (POC) system. This system was developed to demonstrate key technical building blocks required for high throughput, high resolution e-beam step and scan projection lithography.