Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
Results obtained concern the likelihood that randomly chosen machines admit nontrivial decompositions of their state behavior. © 1968 Academic Press Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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Proceedings of SPIE - The International Society for Optical Engineering