Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Computer calculations of the formation of a percolation path across a thin oxide are used to model breakdown. Quantitative agreement with the measured interface state density at breakdown is obtained. The case of homogeneously distributed defects is compared to exponentially distributed defects near one interface.
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME
Robert W. Keyes
Physical Review B
T.N. Morgan
Semiconductor Science and Technology