Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
The variation in radiation resistance with composition of statistical terpolymers of (1) bisphenol‐A and biphenol, and (2) hydroquinone and biphenol, with diphenyl sulphone was studied by electron spin resonance spectroscopy after γ irradiation at 77 K and by analysing volatile products after irradiation at 423 K. Approximately linear relationships were obtained between the radiation chemical yields for both radicals, G(R), and sulphur dioxide, G(SO2), and the mole fraction of biphenol units in the terpolymers. Substantially higher radiation resistance was shown by biphenol units compared with either bisphenol‐A or hydroquinone. Copyright © 1992 Society of Chemical Industry
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
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SPIE Advanced Lithography 2007
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