Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Paper
Rectangular matrix multiplication revisited
Abstract
We give a constant α > 0.294 and, for any ε > 0, an algorithm for multiplying anN×Nmatrix by anN×Nαmatrix with complexityO(N2 + ε). © 1997 Academic Press.
Related
J.P. Locquet, J. Perret, et al.
SPIE Optical Science, Engineering, and Instrumentation 1998
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering
Imran Nasim, Michael E. Henderson
Mathematics