Conference paper
Recent advances in MRAM technology
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005
A method for reducing resistance errors in a collinear four-point probe resistance measurement of a thin film was presented. The positional errors were eliminated to first order using a linear combination of two measurements which differ by interchange of the I- and V-leads. A substantial reduction in absolute error from 3.4% down to 0.01%-0.1%, and an improvement in precision by a factor of 2-4 were shown. The application of the technique to the current-in-plane tunneling method was discussed.
W.J. Gallagher, D.W. Abraham, et al.
VLSI Technology 2005
S.S. Cherepov, B.C. Koop, et al.
Physical Review Letters
A.R. Sitaram, D.W. Abraham, et al.
VLSI Technology 2003
G. Hu, Teya Topuria, et al.
IEEE Magnetics Letters