R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Using an advanced reflection high energy electron diffraction (RHEED) system we found oscillations of the in-plane lattice spacing on the monolayer scale during deposition of Co on Cu(001) [J. Fassbender et al., Phys. Rev. Lett. 75 (1995) 4476]. Here we present in detail the influence of the deposition rate on these oscillations and therefore on the growth process. With increasing deposition rate an enhanced variation of the in-plane lattice spacing occurs which is interpreted as a transition from a layer-by-layer to a more three-dimensional growth mode only for the first two monolayers. An unexpected linear behavior between the deposition rate and the maximum in-plane relaxation is found.
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Ranulfo Allen, John Baglin, et al.
J. Photopolym. Sci. Tech.
Frank Stem
C R C Critical Reviews in Solid State Sciences
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry