Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A powerful technique is described for optimizing electromagnetic codes that involve the boundary element method and nonlinear eigenvalue problems. It is specifically adapted to an algorithm that handles propagation in periodic structures and replaces the standard determinant search and linear equation solution subroutines. Through mechanical speedup and improved numerical convergence, the run time for large cases is reduced by an order of magnitude. Details of technique, the electromagnetic algorithm, and numerical studies are presented. © 1995 by Academic Press, Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Charles A Micchelli
Journal of Approximation Theory
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Fernando Martinez, Juntao Chen, et al.
AAAI 2025