Conference paper
Modeling UpLink power control with outage probabilities
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
Scattered light, flare, is present in the images formed by all photolithography lenses and it reduces lithographic process tolerances. It varies from lens to lens and with time, but is easily measured by observation of images of opaque objects formed in positive photoresist. The scattered light halo of a lens is modeled and the model used to estimate the flare for any reticle used with that lens.
Kenneth L. Clarkson, K. Georg Hampel, et al.
VTC Spring 2007
Veena Rao, William D. Hinsberg, et al.
Microlithography 1994
Ehud Altman, Kenneth R. Brown, et al.
PRX Quantum
R.B. Morris, Y. Tsuji, et al.
International Journal for Numerical Methods in Engineering