Sensitive electron beam resist systems based on acid-catalyzed deprotection

Abstract

Poly(p-t-butoxycarbonyloxystyrene) (PBOCST) and poly(t-butyl p-vinylbenzoate) (PTBVB) provide sensitive, negative tone, electron beam resist systems when sensitized with “onium salt” acid generators. The sensitivity is high (0.5-2.5µC/cm2 at 20 keV) owing to chemical amplification. The resolution and contrast are also high owing to the polarity change incorporated in the design. Development with an organic solvent provides sub-half-micrometer resolution. © 1989 SPIE.