Optimization of real phase-mask performance
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Given a graph with n nodes each of them having labels equal either to 1 or 2 (a node with label 2 is called a terminal), we consider the (1,2)-survivable network design problem and more precisely, the separation problem for the partition inequalities. We show that this separation problem reduces to a sequence of submodular flow problems. Based on an algorithm developed by Fujishige and Zhang the problem is reduced to a sequence of O(n4) minimum cut problems. © 2004 Elsevier B.V. All rights reserved.
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
R.A. Brualdi, A.J. Hoffman
Linear Algebra and Its Applications
John S. Lew
Mathematical Biosciences