Patterning of highly conducting polyaniline films
T. Graham, A. Afzali, et al.
Microlithography 2000
Given a graph with n nodes each of them having labels equal either to 1 or 2 (a node with label 2 is called a terminal), we consider the (1,2)-survivable network design problem and more precisely, the separation problem for the partition inequalities. We show that this separation problem reduces to a sequence of submodular flow problems. Based on an algorithm developed by Fujishige and Zhang the problem is reduced to a sequence of O(n4) minimum cut problems. © 2004 Elsevier B.V. All rights reserved.
T. Graham, A. Afzali, et al.
Microlithography 2000
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.
Arnon Amir, Michael Lindenbaum
IEEE Transactions on Pattern Analysis and Machine Intelligence