Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
We present three alternative simple constructions of small probability spaces on n bits for which any k bits are almost independent. The number of bits used to specify a point in the sample space is (2 + o(1)) (log log n + k/2 + log k + log 1/ϵ), where ϵ is the statistical difference between the distribution induced on any k bit locations and the uniform distribution. This is asymptotically comparable to the construction recently presented by Naor and Naor (our size bound is better as long as ϵ < 1/(k log n)). An additional advantage of our constructions is their simplicity. Copyright © 1992 Wiley Periodicals, Inc., A Wiley Company
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
M.B. Small, R.M. Potemski
Proceedings of SPIE 1989
Ronen Feldman, Martin Charles Golumbic
Ann. Math. Artif. Intell.
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991