Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We present an algorithm which finds a minimum vertex cover in a graph G(V, E) in time O(|V|+( a k)2 k 3), where for connected graphs G the parameter a is defined as the minimum number of edges that must be added to a tree to produce G, and k is the maximum a over all biconnected components of the graph. The algorithm combines two main approaches for coping with NP-completeness, and thereby achieves better running time than algorithms using only one of these approaches. © 1985.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
W.C. Tang, H. Rosen, et al.
SPIE Optics, Electro-Optics, and Laser Applications in Science and Engineering 1991
John A. Hoffnagle, William D. Hinsberg, et al.
Microlithography 2003
Mario Blaum, John L. Fan, et al.
IEEE International Symposium on Information Theory - Proceedings