John G. Long, Peter C. Searson, et al.
JES
Conference paper
Statistical limitations of printing 50 and 80 nm contact holes by EUV lithography
Abstract
No abstract available.
Related
J.A. Barker, D. Henderson, et al.
Molecular Physics
U. Wieser, U. Kunze, et al.
Physica E: Low-Dimensional Systems and Nanostructures
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials