U. Dürig, J.K. Gimzewski, et al.
Physical Review Letters
The utility of two-photon-absorption (TPA) for the fabrication real three-dimensional photoplastic structures with subdiffraction limit (SDL) resolution, based on SU-8 as the polymer matrix was discussed. The TPA photopolymerization process was used as a shutter mechanism for disruptive three-dimensional lithography. The SU-8 lines fabrication was studied by scanning the laser focal spot in regularly spaced straight lines above the 975 nm SU-8/Si interface. Analysis shows that a rapid drop in linewidth as a function of scanning speed was observed which was caused by the incomplete protolysis of the cationic photoinitiator in SU-8.
U. Dürig, J.K. Gimzewski, et al.
Physical Review Letters
N. Blanc, J. Brugger, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
A. Stalder, U. Dürig
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
K. Tsoukalas, F.J. Schupp, et al.
Applied Physics Letters