A 26 ps self-aligned epitaxial silicon base bipolar technology
J.H. Comfort, P.F. Lu, et al.
VLSI Technology 1990
A self-aligned I2 L/MTL technology featuring collectors doped from and contacted by polysilicon, self-aligned collector and base contact edges, and metal-interconnected bases is described. Experimental ring-oscillator circuits designed with 2.5 -μm design rules and fabricated with this technology exhibit gate delays as small as 0.8 ns at Ic –100 μA for fan-in = I and fan-out = 3. Increased wiring flexibility and improved circuit density are inherent advantages of this self-aligned technology. Copyright © 1980 by The Institute of Electrical and Electronics Engineers, Inc.
J.H. Comfort, P.F. Lu, et al.
VLSI Technology 1990
D.D. Tang, F. Fang, et al.
Applied Physics Letters
Denny D. Tang, Tze-Chiang Chen, et al.
IEEE Electron Device Letters
Tak H. Ning
VLSI Technology 2003