Ellen J. Yoffa, David Adler
Physical Review B
Paper
Summary Abstract: Low temperature adsorption and reaction of O2 with Si(111) 7×7
Abstract
No abstract available.
Related
Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Krol, C.J. Sher, et al.
Surface Science
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010