Summary abstract: The low-temperature reactivity of Si(100) with NH3 and NO: Rate determining steps and rate enhancement via electronic excitations

Mark W. Dowley

Solid State Communications

William G. Van der Sluys, Alfred P. Sattelberger, et al.

Polyhedron

J.H. Kaufman, Owen R. Melroy, et al.

Synthetic Metals

R.W. Gammon, E. Courtens, et al.

Physical Review B