W. Jark, T.P. Russell, et al.
Thin Solid Films
Comparison of x-ray-fluorescence-yield and electron-yield surface extended x-ray-absorption fine-structure spectra above the S K edge for c(2×2)S on Ni(100) reveals an order-of-magnitude higher sensitivity for the former technique. Thiophene (C4H4S) chemisorption on Ni(100) is studied with S coverages down to 0.08 monolayer. The molecule dissociates at temperatures as low as 100 K by interaction with fourfold hollow Ni sites. Blocking of these sites by oxygen leaves the molecule intact. © 1985 The American Physical Society.
W. Jark, T.P. Russell, et al.
Thin Solid Films
L. Wenzel, J. Stöhr, et al.
Physical Review Letters
D.A. Outka, J. Stöhr, et al.
Physical Review B
F. Sette, S.J. Pearton, et al.
Physica Scripta